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New pellicle mfg by micro lithography inc. 2.85 um


Article Sent By: l_jones@machine--tools.com (Letha Jones)
Letha Jones is presenting: New pellicle mfg by micro lithography inc. 2.85 um
25 AVAILABLE !! Enter Quantity you need at the bottom.
This is made of NITROCELLULOSE and is 2.85 + or - 0.20 micrometers thickness.
Perfect for use with projection aligners,such as Perkin-Elmer, Canon, or ultratec h steppers.
During the printing process the image of any particle on the pellicle film will be out of focus on the wafer plane and therefore has only a blurry shadow which has a minimal effect on the photomask's image on a wafer. Without pellicle protection, a photomask can easily get a particle on its surface and form a distorted image on the wafer, creating a defect on a chip. Before a time when pellicle was used, a photomask would require daily cleaning and inspection. Consequently, the photomask would easily become contaminated from environment or damaged from cleaning process, resulting in a low die yield and high replacement cost. Once a pellicle is properly attached on the photomask, the surface that is covered by the pellicle is free from future outside particle contamination. The original quality of the photomask can therefore be preserved. Now only a brief inspection of the pellicle film and photomask surface is required to insure the quality of the photomask.
To ensure that MLI pellicles stay clean, a fluoro-polymer anti-reflective coating (FP ARC) is used during the production process. With low surface energy, the coating not only improves transmission but also allows particles to be easily blown off the pellicle membrane.
The diameter is 2.25 inches (O.D.)
Email with any questions, Thanks and Good luck !!!
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New pellicle mfg by micro lithography inc. 2.85 um New pellicle mfg by micro lithography inc. 2.85 um